FR-100 Flux Remover
Flux remover that removes water-soluble flux residues after reflow, used with DI water
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CDR-10T · CDR-50AS Photo Resist Remover
Alkaline strippers that remove dry film and photoresist without damaging the substrate
A product family for stripping water-soluble dry film and photoresist, designed not to affect copper, tin and solder-plated surfaces or aluminum substrates.
CDR-10TAlkaline Photo Resist RemoverCDR-10T is an alkaline remover for water-soluble dry film, liquid resist and photoresist ink. On copper, tin and solder plating it does not affect the material thanks to its anti-oxidation and corrosion protection, and it penetrates easily between high-density fine-pitch lines, splitting the film for fast stripping.
| Tank | Heat-resistant PVC (above 50 ℃), polypropylene |
|---|---|
| Heater | Teflon, titanium |
| Spray equipment | Stainless steel or heat-resistant plastic |
| Nozzle | Cone and fan-type nozzles recommended for maximum stripping efficiency |
| Pump | At least 1.0 psi pressure evenly distributed |
CDR-50ASDry Film StripperCDR-50AS removes dry film without residue or traces. It is designed to be used without attacking aluminum substrates, strips film completely by dipping alone, and suits high-speed equipment with spray foaming.
| Tank | Polypropylene or steel |
|---|---|
| Heater | Stainless steel or Teflon coated |
Overview ↑
Based on a typical process flow. Actual sequence and conditions vary by customer process.
Details are being prepared. Please request the TDS for exact values.
| Method | Immersion · spray |
|---|---|
| Equipment | See the equipment table of each product |
Details are being prepared. Please request the TDS for exact values.
Opens the quote form with this product pre-filled. You can request the TDS or MSDS through the same form.
Tel +82-32-222-0600~1 · E-mail sjahn@chemtechi.com
FR-100 Flux remover that removes water-soluble flux residues after reflow, used with DI water
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